Yazar "Hassan, A. M." seçeneğine göre listele

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    Exploring the impact of substrate placement on Cu3N thin films as a solar cell window layer: Structural and optical attributes
    (Elsevier, 2023) Alyousef, Haifa A.; Hassan, A. M.; Zakaly, Hesham M. H.
    Copper nitride (Cu3N) thin films have garnered significant interest due to their exceptional stability, corrosion resistance, and optical qualities. In this research, Cu3N thin films were produced through reactive dc magnetron sputtering (dcMS) in a nitrogen/argon atmosphere on glass substrates without any external heat treatment. The study examined the effects of substrate positions from the cathode target, and subsequently film thicknesses, on the structure and optical properties of Cu3N thin films. Different methods were employed to examine the structural and optical characteristics of the films, including X-ray diffraction (XRD), scanning electron microscopy (SEM), and ultraviolet-visible-near infrared (UV-vis-NIR) spectrophotometry in the wavelength range of 400-2500 nm. The XRD patterns indicated a cubic crystal structure for the films with a dominant orientation along the (100) plane, while SEM images displayed uniform and smooth surface morphologies for the films. The UV-vis-NIR spectrophotometry findings demonstrated transmittance above 70% in the visible region for the films, and the optical bandgap values ranged between 2.29 and 2.49 eV. The optical conductivity (& sigma;), electrical susceptibility (& chi;c), and optical electronegativity (& eta;opt) have been calculated. Furthermore, the nonlinear optical qualities of Cu3N thin films were discussed, including the nonlinear refractive index (n2), the nonlinear optical susceptibility, and the nonlinear absorption coefficient (& beta;c). The Cu3N thin films showed promising optical properties, suggesting their potential use as a window layer in solar cell technology.
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    Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics
    (Springer, 2023) Alyousef, Haifa A. A.; Hassan, A. M.; Zakaly, Hesham M. H.
    This study investigates the structural and optical characteristics of aluminum nitride (AlN) thin films deposited using reactive magnetron sputtering (dcMS)in an Ar + N-2 (80:20%) atmosphere. The AlN thin films were deposited on a substrate without any heat treatment process, and their structural properties were characterized using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The optical properties of the AlN thin films were studied by analyzing their transmittance and reflection using a double-beam UV-Vis-NIR spectrophotometer within the 300-1000 nm range. The results show that the AlN thin films have a wurtzite structure with a preferred orientation, and the average particle size is in the range of 80-83 nm. The AlN thin films have an average transmittance of approximately 70% and are transparent in the visible spectrum. The direct bandgap increases from 3.70 to 3.98 eV with increasing work pressure, and the refractive index increases to 2.17. Moreover, nonlinear optical parameters, including the nonlinear refractive index n(2) and the nonlinear absorption coefficient beta(c), were calculated for the AlN thin films. The unique characteristics described above suggest potential applications that could make use of these properties.