Time-dependent lateral diffusion in WO3 thin films

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dc.authoridŞeyma Parlatan / 0000-0003-2355-4674en_US
dc.authorscopusidŞeyma Parlatan / 57267804700en_US
dc.authorwosidŞeyma Parlatan / ABF-3308-2020en_US
dc.contributor.authorKarakurt, İsmail
dc.contributor.authorBaşar, Günay
dc.contributor.authorLeiderer, Paul
dc.contributor.authorParlatan, Şeyma
dc.contributor.authorArapoğlu, Nihan
dc.date.accessioned2024-02-21T08:28:08Z
dc.date.available2024-02-21T08:28:08Z
dc.date.issued2023en_US
dc.departmentİstinye Üniversitesi, Sağlık Hizmetleri Meslek Yüksekokulu, Radyoterapi Programıen_US
dc.description.abstractWe have studied the anomalous lateral diffusion process in thin tungsten trioxide films by optical means. The diffusion process seems to start at imperfections within the film a few seconds after the H ion intercalation begins, and progresses parallel to the surface of the film. We measured the mean square displacement of the diffusion front and used its time-dependence to calculate the instantaneous diffusion coefficient. The anomalous exponents are found to be 2.24 and 2.92 for 400 nm and 270 nm thick films, respectively. We explain the observed large diffusion coefficients and depth dependence of the expansion of the film by interfacial job-sharing diffusion of electrons and protons. Raman measurements were also carried out on virgin films, and on films after the lateral diffusion. Although the observed spectrum after the lateral diffusion is, in general, consistent with the literature for H intercalated films, we observe an additional strong band at 855 cm?1. This lateral diffusion process is observed to be irreversible; therefore, it has to be avoided in electrochromic switching devices based on WO.en_US
dc.identifier.citationKarakurt, İ., Başar, G., Leiderer, P., Parlatan, Ş., & Arapoğlu, N. (2023). Time-dependent lateral diffusion in WO3 thin films. Surfaces and Interfaces, 41, 103286.en_US
dc.identifier.doi10.1016/j.surfin.2023.103286en_US
dc.identifier.scopus2-s2.0-85168356746en_US
dc.identifier.scopusqualityN/Aen_US
dc.identifier.urihttps://doi.org/10.1016/j.surfin.2023.103286
dc.identifier.urihttps://hdl.handle.net/20.500.12713/4018
dc.identifier.volume41en_US
dc.identifier.wosWOS:001066346300001en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.institutionauthorParlatan, Şeyma
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofSurfaces and Interfacesen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectTungsten Oxideen_US
dc.subjectElectrochromismen_US
dc.subjectRaman Spectrumen_US
dc.subjectAnomalous Diffusionen_US
dc.subjectInterfacial Job-Sharing Diffusionen_US
dc.subjectIrreversible Processesen_US
dc.titleTime-dependent lateral diffusion in WO3 thin filmsen_US
dc.typeArticleen_US

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