Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics

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dc.authoridTekin, Huseyin Ozan/0000-0002-0997-3488
dc.authoridHassan, Ahmed M./0000-0001-5742-331X
dc.authoridZAKALY, Hesham M.H./0000-0002-7645-9964
dc.authoridAlyousef, Haifa/0000-0003-1727-0958
dc.authorwosidTekin, Huseyin Ozan/J-9611-2016
dc.authorwosidHassan, Ahmed M./GRO-2509-2022
dc.authorwosidAlyousef, Haifa/JFA-6862-2023
dc.authorwosidZAKALY, Hesham M.H./E-8136-2016
dc.contributor.authorAlyousef, Haifa A. A.
dc.contributor.authorHassan, A. M.
dc.contributor.authorZakaly, Hesham M. H.
dc.date.accessioned2024-05-19T14:50:26Z
dc.date.available2024-05-19T14:50:26Z
dc.date.issued2023
dc.departmentİstinye Üniversitesien_US
dc.description.abstractThis study investigates the structural and optical characteristics of aluminum nitride (AlN) thin films deposited using reactive magnetron sputtering (dcMS)in an Ar + N-2 (80:20%) atmosphere. The AlN thin films were deposited on a substrate without any heat treatment process, and their structural properties were characterized using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The optical properties of the AlN thin films were studied by analyzing their transmittance and reflection using a double-beam UV-Vis-NIR spectrophotometer within the 300-1000 nm range. The results show that the AlN thin films have a wurtzite structure with a preferred orientation, and the average particle size is in the range of 80-83 nm. The AlN thin films have an average transmittance of approximately 70% and are transparent in the visible spectrum. The direct bandgap increases from 3.70 to 3.98 eV with increasing work pressure, and the refractive index increases to 2.17. Moreover, nonlinear optical parameters, including the nonlinear refractive index n(2) and the nonlinear absorption coefficient beta(c), were calculated for the AlN thin films. The unique characteristics described above suggest potential applications that could make use of these properties.en_US
dc.description.sponsorshipPrincess Nourah bint Abdulrahman University, Riyadh, Saudi Arabia [PNURSP2023R17]en_US
dc.description.sponsorshipThe authors express their gratitude to Princess Nourah bint Abdulrahman University Researchers Supporting Project (Grant No. PNURSP2023R17), Princess Nourah bint Abdulrahman University, Riyadh, Saudi Arabia.en_US
dc.identifier.doi10.1007/s10854-023-10459-x
dc.identifier.issn0957-4522
dc.identifier.issn1573-482X
dc.identifier.issue13en_US
dc.identifier.scopus2-s2.0-85158058379en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org10.1007/s10854-023-10459-x
dc.identifier.urihttps://hdl.handle.net/20.500.12713/5710
dc.identifier.volume34en_US
dc.identifier.wosWOS:000982180500010en_US
dc.identifier.wosqualityN/Aen_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.relation.ispartofJournal of Materials Science-Materials In Electronicsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.snmz20240519_kaen_US
dc.subjectAluminum Nitride Filmsen_US
dc.subjectChemical-Vapor-Depositionen_US
dc.subjectRefractive-Indexen_US
dc.subjectCrystallographic Orientationen_US
dc.subjectBias Voltageen_US
dc.subjectSolar-Cellsen_US
dc.subjectAinen_US
dc.subjectPressureen_US
dc.subjectGrowthen_US
dc.subjectParametersen_US
dc.titleReactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristicsen_US
dc.typeArticleen_US

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