Growth of Polycrystalline n? CrSe2 Nanosheets Onto p –Si Substrates and their Applications as Rectifiers and Gigahertz Band Filters
Yükleniyor...
Tarih
2024
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Springer
Erişim Hakkı
info:eu-repo/semantics/closedAccess
Özet
a vacuum evaporation technique under a vacuum pressure of 10– 5 mbar. Experimental and theoretical structural investigations have shown the preferred growth of trigonal CrSe2. The unit cell parameters being a = b = 3.520 Å,c = 5.889 Å and P3m1(164) fits well with the standards of trigonal CrSe2 structure. Nanosheets of chromium selenide displayed low defect density of the order of 1010 lines/cm2 along the a? and b axes. Surface morphology studies have shown that CrSe2 nanosheets is composed of spherical grains of average sizes of 200 nm. Optically the interfacing of the n– type CrSe2 nanosheets with p? type Si results in formation of a conduction and valence band offsets of 0.95 eV and 0.47 eV, respectively. These band offsets were found sufficient to allow running the Si/CrSe2 interfaces as pn junction devices. The devices displayed a biasing dependent rectification ratios (asymmetry). The ratios which reached value of 70 can be varied with the applied voltage. Deep analyses of the current transport mechanism of these rectifiers have shown the domination by thermionic and tunneling mechanisms under forward and reverse biasing conditions, respectively. Moreover the pn junction device showed features of band filters with cutoff frequency values suiting gigahertz technology making the device attractive for multifunction operations.
Açıklama
Anahtar Kelimeler
Si/CrSe, Trigonal, Band Offsets, Rectifiers, Gigahertz Technology
Kaynak
Silicon
WoS Q Değeri
Q3
Scopus Q Değeri
Q2
Cilt
Sayı
Künye
Algarni, S. E., Qasrawi, A. F., & Khusayfan, N. M. (2024). Growth of Polycrystalline n-CrSe2 Nanosheets Onto p–Si Substrates and their Applications as Rectifiers and Gigahertz Band Filters. Silicon, 1-8.
